Abstract
Ion beam studies of Semiconductor Multilayers
using RBS/Channeling
Depending on the thickness and the lattice mismatch,
the semiconductor multi-layers can accommodate strain (for small thicknesses)
and relax into dislocations (for large thicknesses). The energetic ion
beams with suitable energies can probe these multi-layers nondestructively
with respect to their defects concetrations as well as the strain determination.
As is well known that this information is crucial for band gap engineering
of the superlattices. Some detailed calculations and recent experimental
results will be presented.